1. Facilities in the Zhou Laboratory

The Zhou laboratory is located on the fourth floor of ECE department’s main building adjacent to Wei’s office.

Computer and Software

• Workstation computers for numerical simulation, data analysis, and image processing. These systems are equipped with Origin 8.1 for data analysis, Lumerical FDTD Solution for electromagnetic modelling and simulation, MATLAB for data analysis, Adobe Illustrator, and Microsoft Office.
• Laptop computers installed with LabView 8 for instrument controlling, and data acquisition.

Combined WITec alpha-300-SR Microscopy System

• Atomic force microscopy (AFM) image: can operate in contact mode, lateral force mode, and tapping mode with lateral x-y resolution down to 2 nm and vertical z resolution down to 0.5 nm.
• Micro-Raman spectroscopy: can measure Raman spectra from 10 cm^-1 to 4200 cm^-1. (Laser excitation at 532 nm, and 785 nm)
• Confocal Raman microscopy: can operate in transmission, reflection mode with spatial diffraction-limited resolution. (Laser excitation at 532 nm, and 785 nm)
• Fluorescence/photoluminescence spectroscopy: can measure fluorescence and photoluminescence spectra from 350 nm to 1050 nm.
• Confocal fluorescence microscopy: can operate in transmission, reflection mode with appropriate filters under specific laser excitation wavelengths.(Laser excitation at 405 nm, 532 nm, 633 nm, 785 nm, and 980 nm)
• Scanning near-field optical microscopy (SNOM): can operate in transmission, collection, or reflection mode with optimal spatial resolution down to 50 nm.
• Near-field optical spectroscopy: can operate in transmission and reflection mode from a subwavelength aperture down to 50 nm in diameter.
• Electroluminescence: the system can couple with current-voltage systems to test electroluminescence of active devices.

Coherent Light Sources

• 405 nm diode laser
• 532 nm frequency doubled Nd:YAG laser
• 633 nm diode laser
• 785 nm diode laser
• 980 nm diode laser

Incoherent Light Sources

• Combined deuterium and halogen light source
• Halogen light source
• Xenon light source
• Mercury light source
• Deuterium light source

Light Detection Modules

• Single Photon Counting Photomultiplier Tube (PMT) Detector
• Highly Efficient Thermoelectrically-cooled Spectroscopy CCD Camera: NIR optimized AR coating, QE > 90% (700 nm – 900 nm)
• Ultra-sensitive Thermoelectrically-cooled Spectroscopy Electron-Multiplication CCD (EMCCD) Camera: VIS optimized AR coating, QE > 90% (500 nm – 700 nm)

 Other  

• Bench-top Centrifuge – Thermo Scientific
• Vortex Shaker – QL-901
• Vacuum Desiccator
• PH meter – SevenCompact
• Ultrasonic bath

2. Facilities in Micro & Nano Fabrication Laboratory at ECE department

Micro & Nano Fabrication Laboratory is located on the sixth floor of ECE department’s main building, which hosts a variety of nano-/micro fabrication, and characterization tools.

Lithography-related Equipment

• Mask Aligner – Karl Suss MA6
• Spin Coater – WS-400B
• SF100-Xpress Lithography System

Thin Film Deposition Equipment   

• E-Beam Evaporator – Kurt J Lesker PVD-250
• Filament Evaporator – Denton Vacuum DU-502A
• Thermal Evaporator – Kurt J Lesker
• RF Plasma-enhanced Chemical vapor Deposition – Trion Orion ll
• Atomic Layer Deposition – Cambridge ALD Savannah 100
• Atomic Layer Deposition – Kurt J. Lesker ALD150LX
• RF Sputtering System– Kurt J Lesker PVD-75
• Drive Laminator- Bio330D A3 Mega

Reactive Ion Etching (RIE) and Asher         

• Deep Reactive Ion Etcher – Adixen AMS100 DRIE
• Reactive Ion Etcher – Trion RIE MINILOCK II
• Reactive Ion Etcher – Samco Table Top Compact RIE-1C
• Plasma Processing – Ion Wave 10

Characterization instruments          

• Probe Station with Semiconductor Electrical Parameteric Analyzer – Keithley 4200 CVI
• Reflectance and Transmittance Measurement System– Filmetrics F10-RTA
• Surface Texture Measurement – Zygo NV7100
• Surface Profiler – Bruker DektakXT
• Spectroscopic Ellipsometer – Woolam Vase HS-190
• Atomic Force Microscope (AFM)- Bruker
• X-ray Diffraction (XRD) – PA-Nalytical Xpert Pro
• Spectrophotometer – Shimadzu UV-VIS-NIR Scanning Spectrophotometer UV-3101PC
• Optical Microscope with camera – Nikon Microphot-SA
• Wide band gap ECV profiler-ACCENT PN4400

Furnaces: Doping and Oxidation    

• Furnaces (Oxidation, Solid Source Boron Doping)

Ovens and Heaters   

• Rapid Thermal Annealing system – AG Heatpulse 610
• Vacuum Programmable Oven-Sitek Processing
• Hot Plate and Magnetic Stirrer-Thermo Scientific

Wafer Processing        

• Wafer Bonder – Karl Suss SB6e
• Micro Automation Dicing Saws
• Wafer Rinser and Dryer-VERTEQ

3. Nanoscale Characterization and Fabrication Laboratory (NCFL) at Virginia Tech

NCFL is housed in ICTAS cooperate research center (CRC) at Virginia Tech, the Nanoscale Characterization and Fabrication Lab (NCFL) is a shared instrumentation facility for researchers. The facility is equipped with more than $10 million in highly specialized equipment.

 Scanning Probe Microscopy (SPM):

• Multimode SPM instruments located in NCFL at VT is used to characterize the surface morphology of nanostructured devices and systems.

Scanning Electron Microscope (SEM)

• SEM is used for geometric/morphologic inspection of key steps (e.g. near-field interference lithography of photoresist nanopatterns, REI and DRIE etching, and template-stripping process) during the nanofabrication process.

Focused Ion Beam (FIB)

• FIB is used as a nano-machining tool to perform geometric measurement and analysis of the cross-section structure of nanostructured devices and systems, which will be combined with high-resolution SEM to extract accurate geometric information for further modelling and numerical simulation of their properties.

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